6

Etching characteristics of TiN used as hard mask in dielectric etch process

Année:
2006
Langue:
english
Fichier:
PDF, 724 KB
english, 2006
49

Plasma Etching Processes for Interconnect Realization in VLSI || Interconnects for Tomorrow

Année:
2015
Langue:
english
Fichier:
PDF, 1.50 MB
english, 2015